SN1300 系列厚膜光刻膠是一種環(huán)氧

固化厚膜負性光刻膠，主要應用于光電子芯

片、MEMS 及半導體封裝等領域。該材料經(jīng)高

溫固化后可以作為絕緣材料保留在芯片內，

具有較好的機械強度及透光性能；

INTRODUCTION

SN1300 series PR is a kind of thick

film negative Epoxy photoresist,mainly used

in IC manufacture such as optoelectronic

chips,MEMS and semiconductor packaging. the material can be retained in the chip as an

insulating material and has good strength &

light transmission performance，After cured at

high temperature;

產(chǎn)品性能

? 膜厚 0.5-100μm；

? 高對比度，適用于≥5:1 高深寬比圖形；

? 高曝光靈敏度（80-250mj/cm

2）；

? 良好工藝兼容性；

? 平坦化性能。

FEATURES

? The thickness range of SN1300 series：

0.5-100μm;

? High contrast&fit for high aspect ratio

lithography ≥5:1;

? High sensitivity（80-250mj/cm2）;

? Good process compatibility;

? Excellent coating performance;

產(chǎn)品型號 PRODUCT RANGE

Spin Curve Pattern Profiles

Product Name SNT150 SN1350 SN1330 SN1320 SN1310 SN1305

Film thickness 80-150um 60-80um 30-60um 13-30um 8-15um 3-7um